The DGA ion coating system is a multifunctional vacuum coating platform that integrates scientific research capability with small-scale production flexibility. Designed specifically for universities, research institutes, and R&D laboratories, it combines magnetron sputtering and cathodic arc deposition technologies within a single chamber.
The system supports multiple power supply modes—DC, MF, RF, and HiPIMS (High Power Impulse Magnetron Sputtering)—offering researchers a highly versatile, stable, and repeatable thin-film deposition solution.
It is suitable for material science studies, process development, and small-batch production of both functional and decorative coatings.
Structure and Specifications
The system features a vertical door-opening design with a compact footprint, ideal for laboratory or pilot-scale environments.
The vacuum chamber has an internal dimension of Φ400 × 400 mm, optimized for coating small- to medium-sized samples and precision parts.
A dual-layer water-cooling jacket ensures uniform temperature distribution and process stability, enabling long-duration experiments without thermal distortion.
Deposition Methods and Process Configuration
The DGA system integrates magnetron sputtering and cathodic arc deposition, combining the advantages of high coating density and excellent adhesion:
- Magnetron sputtering produces smooth, uniform, and dense coatings, ideal for functional and decorative films.
- Cathodic arc deposition generates high-energy ion flux for strong adhesion and superior film hardness.
Supported power modes:
- DC (Direct Current): for metallic targets
- MF (Mid-Frequency): for oxides and non-conductive targets
- RF (Radio Frequency): for dielectric or functional thin films
- HiPIMS: for high ionization and ultra-dense coatings with improved adhesion and mechanical properties
The system supports multi-target configurations, enabling multilayer, composite, or gradient film structures for advanced materials research.
Cathodic Arc System
The system is equipped with three high-performance cathodic arc sources (Φ100 × 40 mm).
Each arc source can be independently controlled to adjust discharge current, allowing flexible operation for sequential or co-deposition.
This configuration supports various film architectures, including multilayer, composite, and graded coatings, ideal for experimental development and performance optimization.
Vacuum and Control System
A high-efficiency vacuum pumping system (mechanical pump + turbomolecular pump) provides rapid evacuation and maintains a clean, high-vacuum environment.
The fully automated control platform allows precise adjustment of target power, arc current, gas flow, and substrate bias voltage, with real-time monitoring and data logging.
Users can save and recall coating recipes, reducing human error and improving process repeatability.
Operational Features
- Convenient front or top door access for easy sample loading and maintenance
- Multi-target configuration for fast target switching or hybrid deposition
- User-friendly control interface suitable for research, education, and demonstrations
Depositable Materials and Film Characteristics
- Supports a wide range of metal and compound targets, including Ti, Cr, Zr, Al, and Mo.
- Typical coatings include TiN, CrN, ZrN, TiCN, TiAlN, and other high-performance films.
- These coatings offer high hardness, strong adhesion, excellent wear and corrosion resistance, and aesthetic color variations.
Available Coating Colors
By adjusting target type, reactive gas ratios, and substrate bias, the system can produce coatings in various colors such as gold, silver, gunmetal black, blue, and rainbow tones.
The resulting films exhibit smooth texture, high density, and uniform color, suitable for both functional research and decorative demonstrations.
Applications
- Thin-film material studies and property evaluation.
- Development of new coating processes and surface engineering technologies.
- Educational and demonstration use in universities and research institutes.
- Small-batch coating of precision parts and functional components.
The DGA Ion Coating System offers unmatched flexibility in process configuration, superior vacuum stability, and precision control.
It provides an ideal experimental and production platform for both academic and industrial users—whether for new material development, thin-film analysis, or small-batch high-performance coating production—ensuring consistent, high-quality results every time.
