Structural Design:
Available in both vertical and horizontal configurations, the system features a well-optimized chamber layout with ample loading and unloading space, facilitating the operation and maintenance of workpieces in various sizes and shapes. Its robust structure and uniform temperature control ensure excellent process adaptability and high operational reliability.
High-Power Deposition Supply:
Equipped with a high-power deposition power source, the system introduces reactive gases to trigger chemical reactions under plasma conditions, achieving efficient film formation. The precise ion-assisted energy control guarantees dense coating structures, superior adhesion, and consistent performance stability.
High Vacuum and Atmosphere Control:
The system adopts an efficient vacuum pumping group (mechanical pump + Roots pump + molecular pump combination) along with an accurate gas-atmosphere control system to maintain a clean deposition environment and stable pressure. It supports precise gas-flow ratio control for multiple gases (such as CH₄, H₂, N₂, Ar, etc.), ensuring excellent process repeatability and uniform coating quality.
Performance Advantages:
· High coating hardness with outstanding wear and corrosion resistance.
· Uniform deposition achievable under relatively low-temperature conditions, suitable for heat-sensitive materials.
· Compatible with complex shapes and large-sized precision components, offering controllable coating thickness and uniformity.
· Strong film adhesion and significantly extended service life.
Coating Materials and Types:
Capable of depositing a wide range of high-performance functional coatings, including TiN, CrN, ZrN, TiCN, Al₂O₃, Si₃N₄, and Diamond-Like Films, to enhance hardness, wear resistance, and thermal stability.
Application Fields:
Widely applied in the tooling, mold, bearing, precision machinery, and aerospace industries for the preparation of functional coatings requiring high-temperature resistance, wear resistance, and corrosion protection. It is an advanced ion-gas deposition system designed for the realization of high-performance coating applications.
Deposition Space:
Designed for inner-wall coating deposition of elongated tubes with inner diameters of Φ40 mm × 3000 mm, Φ100 mm × 6000 mm, and Φ150 mm × 4500 mm.
Stable Structural Design:
A dedicated chamber and gas-flow distribution system are specially engineered for long, hollow workpieces. This ensures uniform reactive gas distribution** inside the tube, significantly enhancing deposition uniformity and coating consistency along the entire length.
High-Power Heating and Atmosphere Control: Equipped with a high-power heating system and precise atmosphere control, the equipment enables stable chemical reactions to form high-performance, dense, and adherent coatings under optimized CVD conditions.
Performance Advantages:
* Capable of depositing hard and wear-resistant coatings with high film density.
* Excellent control of coating thickness uniformity on internal surfaces.
* Ideal for complex-shaped or long, high aspect-ratio hollow components.
Wide Applications:
Widely used for inner-wall protection of chemical pipelines, precision mechanical components, and parts in corrosion- and wear-resistant industries requiring enhanced durability and performance.
Deposition Space:
Capable of growing diamond and gem-quality crystals with diameters of Φ60 mm and Φ80 mm, as well as producing diamond optical mirrors of the same sizes.
Stable Structural Design:
Features a dedicated reaction chamber with precise temperature and atmosphere control, ensuring stable and consistent crystal growth throughout the process.
Core Process Technology:
Utilizes Microwave Plasma Chemical Vapor Deposition (MPCVD) technology, where carbon-source gases are activated under high-temperature and high-vacuum conditions to form high-quality diamond crystals.
Atmosphere and Vacuum Control:
Equipped with a high-efficiency vacuum pumping system and precision gas flow control unit, maintaining a clean reaction atmosphere and achieving high carbon-source utilization efficiency.
Performance Advantages
· Grows high-purity diamonds with excellent optical and mechanical properties.
· Produces diamond mirrors suitable for optical, precision mechanical, and electronic applications.
· Ensures stable crystal size and high structural integrity.
Applications:
Widely used for gem-quality diamond cultivation, diamond optical mirror fabrication, and industrial-grade diamond material production.
Deposition Space:
Capable of producing silicon carbide (SiC) mirrors with diameters of Φ60 mm, Φ80 mm, Φ100 mm, and Φ120 mm, meeting the requirements of multiple product specifications.
Stable Structural Design:
Employs a high-precision chamber and support structure to ensure minimal deformation and dimensional stability of the mirrors during the deposition process.
Core Process Technology:
Equipped with a high-frequency power supply to activate reactive gases, enabling SiC deposition and formation under plasma conditions.
Atmosphere and Vacuum Control:
Features a high-efficiency vacuum system combined with precise atmospheric regulation, ensuring high SiC purity and uniform coating quality.
Performance Advantages：
· Produces high-density, high-purity SiC mirrors.
· Exhibits excellent surface smoothness, thermal stability, and mechanical strength.
· Customizable in size to meet diverse application needs.
Applications:
Widely used in semiconductor manufacturing, integrated circuits, precision optical systems, and high-power laser devices.
