Research-Grade Design:
Vertical front-opening structure with a chamber size of Φ500 × 500 mm, featuring easy operation and convenient maintenance.
Multi-Angle Deposition:
Equipped with a top-mounted heated rotating substrate holder supporting planetary rotation and adjustable angles, with temperatures up to 500 °C, suitable for complex-shaped samples.
Process Versatility:
Configured with four adjustable 2-inch planar magnetron targets compatible with DC, MF, dual-pulse, and RF power supplies, enabling deposition of metals, oxides, nitrides, carbides, and other compound films.
High-Vacuum Environment:
Advanced molecular pump system and optimized gas-flow design ensure stable, dense, and uniform film deposition.
Intelligent Control:
Fully automated control system provides precise parameter setting, real-time process monitoring, and data recording.
Wide Applications:
Ideal for the preparation and research of functional thin films, optical coatings, semiconductor devices, electrical contact layers, decorative coatings, and academic experiments.
Flexible Chamber Design:
Vertical front-opening Φ600×600 mm (H) chamber for easy operation and maintenance, ideal for research and pilot-scale coating.
Precision Rotation System:
Bottom dual-rotation (planetary + self-rotation) design with adjustable speed ensures high film uniformity and density.
Multi-Process Compatibility:
Four rectangular magnetron targets configurable for metals, ceramics, oxides, nitrides, and carbides.
Versatile Power Options: Supports DC, MF, RF, and HiPIMS power modes for diverse process and material needs.
Ion Source Assistance:
Optional ion source improves adhesion, cleaning, and film densification.
High Vacuum & Smart Control:
Molecular pump system ensures a clean vacuum; automated control enables precise settings, monitoring, and data logging with remote access.
Wide Applications:
Suitable for hard, wear-resistant, functional, decorative, and oxide coatings in research and industrial use.
Medium-Scale Process Platform:
Φ800×800 mm (H) chamber for process development and small-batch coating of cutting tools, decorative parts, and optical substrates.
High-Uniformity Deposition:
Bottom rotary holder with self-rotation and planetary motion ensures uniform, dense, and smooth films.
Multi-Process Compatibility:
Four rectangular magnetron targets support various materials—Ti, Al, Cr, SUS, TiN, CrN, AlN, ZnO, ITO—for metal, ceramic, and oxide coatings.
Flexible Power Configuration:
HiPIMS, DC, MF, and RF bias power modes meet diverse needs for adhesion, conductivity, and optical performance.
Ion-Source Enhancement (A Type): Auxiliary ion source improves film density, adhesion, and surface activation.
High Vacuum & Intelligent Control:
Turbomolecular pump ensures a clean vacuum; automated system provides precise control, monitoring, and data recording.
Wide Applications:
Ideal for hard, wear-resistant, functional, optical, and decorative coatings.
Educational Platform:
Φ300 × 250 mm chamber designed for teaching and training in thin film deposition at universities and research institutes.
Hands-On Operation:
Manual control allows students to practice vacuum pumping, venting, and sputtering setup, helping them understand the working principles of vacuum coating.
Single-Target Configuration:
One 4-inch planar magnetron target supports DC sputtering of Al, Ti, SUS, and Cu for basic metallic film deposition.
Compact & User-Friendly:
Vertical top-opening design saves space and simplifies sample handling—ideal for classrooms and small labs.
Stable Vacuum System:
8 L/s rotary vane pump achieves reliable low-vacuum conditions for uniform film formation.
Wide Applications:
Perfect for teaching, training, and entry-level thin film experiments in materials, physics, and electronics.
Large-Scale Production Platform:
Φ1000 × 1000 mm (H) chamber for industrial coating of glass panels, decorative parts, tools, and optical components.
High-Uniformity Deposition:
Bottom rotary table with adjustable self-rotation and planetary motion ensures uniform, dense, and smooth large-area coatings.
Multi-Process Compatibility:
Four rectangular magnetron targets support metals (Ti, Cr, Al, Zr), ceramics (Al₂O₃, SiO₂), and composites (TiN, CrN, TiAlN, ZrN) for multilayer coatings.
Optimized Power Configuration:
DC, MF, and Bias power options meet diverse needs for hard, decorative, and functional films.
Ion Source Assistance:
Integrated ion source improves density, adhesion, and interfacial bonding through surface ion bombardment.
High Vacuum & Smart Control:
Turbomolecular pump ensures clean vacuum; automated control enables precise parameters, monitoring, and data logging.
Wide Applications:
Ideal for mass production of hard, wear-resistant, functional, and decorative coatings.
Ultra-Large Production Platform:
Φ1300 × 1200 mm (H) chamber designed for large parts and mass production of glass, molds, tools, decorative panels, and optical components.
Dual-Process Integration:
Combines four cylindrical magnetron targets and eight arc sources for hybrid sputtering + arc ion plating, achieving high deposition speed, strong adhesion, and dense films.
High-Uniformity Deposition:
Bottom rotary table with planetary + self-rotation ensures even coating distribution, smooth surface, and uniform film thickness on complex substrates.
Flexible Power Configuration:
DC magnetron and Bias power support conductive, insulating, and composite materials, enabling multilayer, gradient, or decorative coatings.
Ion Source Assistance:
High-efficiency ion source enables surface activation, in-situ cleaning, and adhesion enhancement before coating.
High Vacuum & Intelligent Control:
Turbomolecular + mechanical pump system provides rapid pumping and stable high vacuum. Automated control supports precise parameter setting, real-time monitoring, and fault alarms.
Coating Materials:
Applicable for Ti, Cr, Al, Zr, TiN, CrN, ZrN, TiAlN, AlTiN, and decorative films (gold, silver-gray, black, multicolor).
Wide Applications:
Ideal for industrial-scale production of hard, wear-resistant, functional, and decorative coatings across multiple industries.
Ultra-High-Capacity Platform:
Φ1600 × 1200 mm (H) chamber for large components and high-volume coating of glass, molds, decorative parts, and optical elements.
High-Efficiency Deposition System:
Equipped with eight cylindrical magnetron targets and eight arc sources for hybrid sputtering + arc plating, achieving high deposition rates and dense, high-quality films.
Long-Life Target Design:
Rotating cylindrical targets ensure uniform erosion, stable plasma, and extended target life for reduced maintenance costs.
High-Uniformity Coating:
Bottom rotary holder with adjustable planetary + self-rotation provides even thickness, smooth finish, and dense structure across large substrates.
Advanced Power Configuration:
Four dual-pulse MF power supplies and one Truplasma 4020 bias unit allow precise control for metallic, nitride, oxide, and multilayer coatings.
Ion Source Enhancement: High-efficiency ion source enables surface cleaning, activation, and energy adjustment to enhance adhesion and coating performance.
High Vacuum & Intelligent Control:
Turbomolecular + mechanical pump system ensures rapid, stable vacuum; automated control provides real-time monitoring, data logging, and process traceability.
Coating Materials & Applications:
Supports Ti, Cr, Al, Zr, TiN, CrN, ZrN, TiAlN, and decorative films (black, gold, silver-gray, multicolor).
Ideal for hard, wear-resistant, functional, and decorative coatings in industrial-scale PVD production.
Large-Scale Production Capacity:
Chamber size Φ1100 × 1200 mm with vertical cylindrical design, built for large workpieces and high-volume production. Ideal for molds, cutting tools, and precision components needing high-performance coatings.
High-Energy Arc Source System:
Twelve high-energy arc sources with independent DC power provide high plasma density and fast deposition, forming dense, durable, and strongly adherent films.
Dual-Layer Cooling Jacket:
Dual-layer water-cooling design ensures efficient temperature control, maintaining stable process and consistent film quality during long runs.
Advanced Power Configuration:
Equipped with a Truplasma 4020 bias power supply for precise ion energy control, enhancing adhesion, reducing stress, and preventing delamination.
AEGD Technology:
Arc Enhanced Glow Discharge (AEGD) improves film microstructure, producing denser, smoother, and more wear- and corrosion-resistant coatings.
Multi-Target Process Capability:
Supports various targets such as CrAlSiW, TiAl, CrAl, TiAlN, and CrN, enabling development of specialized coatings for different applications.
Fully Automated Intelligent Control:
Automatic control module with precise parameter setup, real-time monitoring, and data logging ensures stable, repeatable, and traceable production.
Application Specialization:
Designed for molds, cutting tools, stamping parts, and wear-resistant components. Provides coatings with high hardness, strong adhesion, and corrosion resistance—ideal for advanced manufacturing and precision machining.
Ultra-Large Effective Deposition Zone:
Chamber size Φ1700 × 950 mm (H), designed for large or high-volume electronic parts. Ideal for mobile phone frames, decorative parts, glass panels, and premium housings.
Dual-Process Integration:
Combines cylindrical magnetron sputtering and arc deposition for high deposition rate and dense films. Magnetron targets ensure uniformity, while arc sources enhance adhesion.
Precision Magnetic Field System:
Hybrid magnetic design with permanent and electromagnetic fields allows fine adjustment for optimized film uniformity and bonding.
Powerful Energy Configuration:
Equipped with sixteen AE sputtering, ten 250 A arc, and one 40 kW bias power supplies. Supports multi-target, multilayer, and composite coatings with precision.
AEGD Technology:
Arc Enhanced Glow Discharge boosts plasma density for better adhesion, smoother surfaces, and improved wear and corrosion resistance.
High-Vacuum Integrity:
Three Shimadzu 350-flange turbomolecular pumps provide fast pumping and ultra-clean vacuum, minimizing contamination for stable coatings.
Fully Automated Intelligent Control:
Automated system with precise control, real-time monitoring, and data logging ensures stable, repeatable, and traceable production.
Extensive Material Compatibility:
Supports Ti, Cr, Al, Zr, SUS, and alloy targets. Enables coatings such as TiN, CrN, ZrN, TiAlN, CrAlN, and conductive ITO.
Specialized Applications:
Ideal for phone frames, electronic housings, wearables, and hardware. Delivers coatings with strong adhesion, high gloss, and durability for aesthetic and functional use.
Professional High-Temperature Coating Platform:
Φ1200 × 1300 mm chamber with 1000 × 1000 mm effective area, designed for aerospace, turbine, and energy components. Delivers protective and functional coatings for Ni-, Co-, and Cr-based superalloys under extreme heat and stress.
High-Energy Deposition System:
Sixteen cathodic arc sources powered by sixteen 200 A DC arc supplies ensure dense, high-adhesion coatings within short cycles.
Dual-Layer Cooling Jacket:
Advanced water-cooling structure maintains stable temperature and uniform heat distribution for consistent quality on heat-sensitive substrates.
Advanced Bias System:
40 kW Truplasma 4020 bias power provides dynamic voltage control, improving adhesion, oxidation, and corrosion resistance.
AEGD Ion Cleaning:
Arc Enhanced Glow Discharge plasma cleaning removes oxides and contaminants for a clean substrate surface before coating.
Specialized Target Materials:
Compatible with NiCrAlY, CoCrAlY, MCrAlY, NiAl, and CrAlSi for oxidation-resistant and thermal barrier coatings.
High Vacuum Integrity:
Turbomolecular pump ensures fast evacuation and clean, stable vacuum for high-purity coatings.
Specialized Applications:
Ideal for turbine blades, nozzles, guide vanes, and hot-section components in aerospace and energy systems, providing superior oxidation, heat, and corrosion resistance.
Large Coating Volume:
Φ1100 × 1200 mm (H) chamber with 900 × 900 mm effective area, suitable for batch coating of medium to large components and complex parts.
Stable Structural Design:
Cylindrical dual-layer water-cooled chamber ensures efficient temperature control, uniform heating, and stable coating quality.
Multiple Ion Source Options:
Optional Anode Layer Ion Source (ALS) or Anode Ionization Source (AIS) supports surface activation, pretreatment, and carbon-based film deposition.
Flexible Magnetron Configuration:
Supports rectangular and cylindrical magnetron targets using materials such as C, Ti, Cr, W, CrC, TiC for multilayer metallic and carbon-based coatings.
High Vacuum Environment:
High-performance turbomolecular pump maintains clean, stable vacuum for high film purity, density, and consistency.
Superior Coating Performance:
Type A: DLC film hardness ≥3000 HV, thickness 2–3 μm, excellent wear and scratch resistance.
Type B: Carbon-based composite film hardness ≥2500–2800 HV, with high toughness and low friction.
Wide Applications:
Ideal for molds, cutting tools, friction components, precision parts, and decorative products—enhancing durability, reducing friction, and improving surface finish.
The DLC-1112 integrates ionization and magnetron sputtering technologies to achieve high hardness, strong adhesion, and superior tribological performance for advanced industrial coatings.
High-Hardness Coating Capability:
Deposits diamond-like carbon (DLC) coatings with hardness up to 2500 HV, offering superior wear resistance, scratch resistance, and stable low-friction performance for high-load, high-impact components.
Multi-Source Hybrid Configuration:
Integrates four anode ion sources and two magnetron sputtering targets for flexible DLC, metal-DLC, and multilayer coatings. High-density plasma enhances adhesion, while sputtering targets form metallic or composite interlayers for optimized strength and functionality.
High-Power Energy System:
Features four 15 kW ion source supplies, two 40 kW magnetron supplies, and one 30 kW single-pulse bias supply for precise control of ion energy and deposition rate—ensuring uniform, dense, and reproducible coatings.
Dual-Layer Cooling Structure: Water-cooled dual-layer chamber maintains consistent process temperature and stability for continuous, reliable production.
Large Deposition Area:
Φ1000 × 1500 mm chamber accommodates large molds, precision parts, and batch processing of multiple workpieces.
Intelligent Automated Control:
Fully automated system with accurate parameter setup, real-time monitoring, and complete data logging for stable, traceable, and repeatable operation.
Specialized Applications:
Ideal for punches, molds, piston rings, bearings, and friction components. Produces low-friction, high-adhesion, wear-resistant coatings that reduce wear and energy loss while extending service life.
By combining high-density ion sources with magnetron sputtering, the DLC-1218A delivers smooth, durable, high-performance DLC coatings for tooling, precision machinery, and industrial wear protection.
High-Throughput Production:
Designed for large-area metal plates and complex components, the DH-40 series offers efficient, high-volume coating solutions for stainless-steel, decorative, and architectural applications.
Flexible Design:
DH-40A: Vertical top-opening with central hearth for flat panels.
DH-40B: Top-opening with suspended rotating frame for irregular components.
High-Efficiency Arc System:
Equipped with 40 cathodic arc sources (Φ100 × 40 mm) and independent 200 A DC supplies, ensuring stable plasma, high deposition rate, and uniform coatings.
Bias & Vacuum Systems:
60 kW single-pulse bias enhances adhesion.
Type A: Diffusion pump for decorative and continuous coating.
Type B: Turbomolecular pump for high-purity, high-density coatings.
Large Capacity:
Type A—4 sheets (1300 × 2500 mm); Type B—6 sheets (1300 × 4000 mm) or large irregular components.
Coating Materials & Colors:
Supports Ti, Zr, Cr, Al, and their nitride, carbide, and oxide compounds (e.g., TiN, ZrN, CrN, TiCN, TiO₂). Produces gold, rose gold, champagne, gunmetal, diamond black, copper, and bronze finishes with excellent hardness, wear, and corrosion resistance.
Applications:
Ideal for elevator panels, stainless-steel doors, curtain walls, kitchen décor, and architectural hardware.
The DH-40 delivers high efficiency, rich color effects, and durable performance for large-scale decorative and protective coating production.
Compact Coating Chamber:
Φ400 × 400 mm chamber with efficient layout, ideal for research, laboratories, and small-batch coating development. Suitable for rapid testing and process optimization.
Stable Design:
Vertical top-opening structure enables easy loading, target replacement, and maintenance, supporting frequent process adjustments and multi-material use.
Multi-Target Setup:
Three cathodic arc sources (Φ100 × 40 mm) allow single or multi-target operation for single-layer, multilayer, and composite coatings.
High-Vacuum System:
Efficient pumping ensures fast evacuation, clean deposition, and coatings with strong adhesion and high density.
Performance:
Coating hardness up to 3000 HV, thickness adjustable from 0.5–3 μm. Compatible with Ti, Cr, Zr, Al, TiN, CrN, TiAlN, and ZrN.
Applications: Ideal for R&D, teaching, coating evaluation, and small-part surface treatment in both functional and decorative applications.
Medium-Sized Coating Chamber:
Chamber size ranges from Φ800 to Φ1300 mm in diameter and 800 to 1500 mm in height, suitable for medium-sized workpieces and moderate batch production. Ideal for cutting tools, molds, and precision parts requiring high durability and performance.
Stable Structural Design:
Vertical top-opening structure allows safe and easy operation, with a dual-layer water-cooling jacket ensuring efficient heat control and uniform temperature during continuous operation.
Multi-Arc Source Configuration:
Configurable with multiple cathodic arc sources (Φ100 × 40 mm) that provide high-density plasma and stable ion flux, resulting in dense, uniform coatings with strong adhesion.
High-Vacuum Environment:
Equipped with mechanical and molecular (or diffusion) pumps for fast pumping and clean vacuum conditions, ensuring high film purity, low contamination, and consistent coating quality.
Key Performance:
Coating hardness up to 3000 HV; film thickness adjustable from 2–5 μm; strong adhesion and stable multilayer or composite coating performance.
Coating Materials:
Supports Ti, Cr, Zr, Al, and their nitride, carbide, and oxide compounds, including TiN, CrN, ZrN, TiAlN, CrAlN, and TiCN.
Applications:
Widely used for coating tools, molds, stamping parts, and mechanical components to improve wear resistance, corrosion resistance, and surface quality—ideal for precision machining and industrial hard coating production.
Medium-Sized Coating Chamber:
Chamber size Φ1500–Φ2100 × 1200–2100 mm, suitable for medium to large decorative workpieces such as metal accessories, sanitary fittings, and 3C housings, supporting efficient batch production.
Stable Structure:
Vertical top-opening chamber with dual-layer water cooling ensures uniform temperature, stable operation, and consistent coating color for continuous production.
Multi-Arc Source System:
Multiple cathodic arc sources (Φ100 × 40 mm) generate high-density plasma for smooth, uniform, and strongly adherent coatings.
High-Vacuum System:
Mechanical + molecular (or diffusion) pump setup achieves fast evacuation, reducing oxidation for bright, clean, and durable finishes.
Performance:
Film thickness 0.3–1.5 μm; mirror-like surface; strong adhesion; excellent corrosion and wear resistance; long-lasting color stability.
Coating Materials & Colors:
Supports Ti, Zr, Cr, Al, and their compounds (TiN, ZrN, CrN, TiCN, TiO₂). Produces gold, rose gold, champagne, gunmetal black, coffee, bronze, and antique bronze finishes.
Applications:
Ideal for watches, eyewear, 3C parts, faucets, decorative panels, and hardware, providing high-quality, colorful, and durable PVD coatings.
Large Deposition Capacity:
Designed for mass production of medium to large 3C housings, precision metal parts, and decorative components. The spacious chamber supports multiple workpieces, improving efficiency and throughput.
Stable Structural Design:
Vertical front- or top-opening design ensures convenient operation. The water-cooling system maintains uniform temperature and consistent color and film thickness.
Multi-Process Integration:
Combines mid-frequency cylindrical magnetron sputtering, ion-source enhancement, and cathodic arc pre-coating. Forms a composite “arc adhesion + magnetron main + ion-modified” structure for dense, durable, and colorful metallic coatings.
Vacuum System:
Mechanical, Roots, and molecular pumps provide fast, stable high vacuum, ensuring clean deposition and high film purity.
Performance:
Adjustable film thickness 0.3–1.5 μm; rich metallic colors; high gloss; excellent adhesion, corrosion, and wear resistance; stable batch production quality.
Coating Materials & Colors:
Supports Ti, Cr, Zr, Al, and their nitride, carbide, and oxide coatings (e.g., TiN, ZrN, CrN, TiCN, TiO₂). Produces gold, rose gold, champagne, gunmetal black, blue, coffee, and bronze finishes.
Applications:
Ideal for 3C housings, watches, eyewear, decorative hardware, and sanitary fittings. The PVD-1915 combines advanced sputtering and arc technologies to deliver high-quality, durable, and visually refined coatings for large-scale decorative and functional production.
Large Deposition Capacity:
Spacious chamber designed for efficient batch production of medium to large 3C housings, precision parts, and decorative components. Supports multiple workpieces per cycle for high productivity and coating consistency.
Stable Structural Design:
Vertical front- or top-opening design enables easy operation and maintenance. The high-efficiency circulation cooling system maintains uniform temperature and ensures stable film thickness and color across batches.
Multi-Process Integration:
Supports mid-frequency pulsed magnetron sputtering, ion-source enhancement, and bias-assisted coating. Optional HiPIMS power provides higher ionization and denser films with superior adhesion, hardness, and wear resistance.
Vacuum System:
Combined mechanical, Roots, and molecular pumps enable rapid evacuation and stable high vacuum, minimizing contamination and ensuring coating purity.
Performance:
Adjustable film thickness 0.3–1.5 μm; strong adhesion; high hardness; excellent corrosion and oxidation resistance; supports multilayer and composite coatings.
Coating Materials & Colors:
Compatible with Ti, Cr, Zr, Al, and their nitride, carbide, and oxide coatings (e.g., TiN, ZrN, CrN, TiCN, TiO₂). Produces premium finishes such as gold, rose gold, champagne, gunmetal black, blue, coffee, and bronze.
Applications:
Ideal for 3C housings, watches, eyewear, sanitary fittings, decorative hardware, and precision metal accessories.
With advanced sputtering, optional HiPIMS technology, and intelligent control, the PVDR5 delivers durable, high-gloss decorative and functional coatings for premium industrial production.
Compact Vacuum Chamber:
Φ400 × 400 mm chamber with modular design, ideal for research institutes and laboratories conducting small-batch, multi-material coating and thin-film studies.
Stable Structural Design:
Vertical top-opening structure allows quick substrate and target replacement, easy maintenance, and high flexibility for experimental process switching and repeatability.
Multi-Target Configuration:
Supports magnetron sputtering and cathodic arc sources operating independently or in hybrid mode for diverse coating and composite film development.
High Vacuum Environment:
Equipped with a mechanical and turbomolecular pump system for rapid evacuation and clean deposition, ensuring dense, high-purity, and strongly adherent films.
Key Performance:
Compatible with DC, MF, RF, and HiPIMS power; supports Ti, Cr, Zr, Al, W, TiN, CrN, ZrN, TiAlN, CrAlN, and DLC coatings. Film hardness >3000 HV (material-dependent), thickness adjustable 0.5–3 μm with excellent smoothness and adhesion.
Applications:
Suitable for thin-film R&D, process optimization, educational use, and small-scale precision coating.
The DGA provides a flexible, precise, and reliable platform bridging scientific research and industrial coating application.
Coating Chamber:
Large-capacity chamber designed for batch production of medium to large 3C housings, precision parts, and decorative components. Supports simultaneous coating of multiple workpieces with high efficiency and uniformity.
Structural Design:
Vertical front-opening or top-lid structure allows easy loading and maintenance. The efficient cooling system ensures uniform temperature and stable process control for consistent film quality.
Coating Process:
Supports mid-frequency pulsed magnetron sputtering, ion-source assistance, and bias power combinations. Optional HiPIMS power enables ultra-dense, high-adhesion coatings with rich metallic color and gloss.
Vacuum System:
Mechanical, Roots, and turbomolecular pumps provide rapid evacuation and a clean vacuum environment, minimizing impurities and ensuring dense, pure coatings.
Performance:
Adjustable film thickness 0.3–1.5 μm; excellent adhesion, corrosion, and wear resistance; supports multilayer and composite coatings for both decorative and functional purposes.
Coating Materials & Colors:
Compatible with Ti, Cr, Zr, Al, and their compounds such as TiN, CrN, ZrN, TiAlN, and CrAlN. Produces gold, rose gold, champagne, gunmetal black, blue, and coffee brown finishes with bright gloss and stable tones.
Applications:
Ideal for 3C housings, watches, eyewear, decorative hardware, and sanitary fittings.
The DGB system combines beauty and durability, providing a reliable solution for high-end decorative and functional vacuum ion coating production.
Deposition Chamber:
Available in Φ800 × 800 mm, Φ900 × 1000 mm, and Φ1000 × 1200 mm configurations, suitable for tools, shafts, and complex components. Ideal for both research and batch production of tetrahedral amorphous carbon (TAC) coatings.
Stable Structural Design:
Vertical structure with optimized layout ensures ample space, easy operation, and stable temperature control for continuous, long-term coating performance.
Multi-Process Integration:
Combines cathodic arc magnetic filtration with magnetron sputtering to remove arc droplets, reduce impurities, and improve coating density, smoothness, and adhesion strength.
High-Vacuum Environment:
Mechanical, Roots, and turbomolecular pump system achieves rapid high vacuum for a clean, stable deposition process and uniform coating results.
Performance:
Deposits high-hardness TAC coatings with excellent wear resistance; reduces built-up edges on aluminum tools; allows precise control of film thickness and surface roughness; stable under high temperature and friction.
Coating Materials:
Supports C, Ti, Cr, W, TiC, CrC, TiAlN, and DLC targets for both functional and composite coating applications.
Applications:
Suitable for cutting tools, molds, aluminum alloy parts, bearings, shafts, and precision moving components.
An ideal solution for high-hardness, wear-resistant coatings in advanced manufacturing and surface protection.
Deposition Space:
Uses a roll-to-roll vacuum coating process for flexible substrates such as PET, PE, BOPP, and PI (≥0.4 μm). Supports single- or double-sided continuous coating for high-efficiency industrial production.
Stable Structural Design:
Features a high-precision web handling and winding system with adjustable tension control. Automatic edge correction and closed-loop tension ensure film flatness, uniform coating, and stable long-term operation for continuous mass production.
Multi-Process Integration:
Supports magnetron sputtering and cathodic arc deposition—used separately or in combination. Magnetron sputtering enables high-purity metallic and functional films, while arc deposition provides strong adhesion and thick coatings. Suitable for conductive, reflective, decorative, and functional films.
High-Vacuum Environment:
Multi-zone pumping system (mechanical + Roots + turbomolecular) ensures rapid evacuation, low contamination, and dense, high-purity coatings.
Performance:
Enables coating of conductive metals (Al, Cu, Ag, Cr, Ni, etc.) on flexible films; supports double-sided uniform deposition; offers precise thickness control and high adhesion. Produces conductive, reflective, and barrier films with excellent bending durability.
Applications:
Ideal for solid-state capacitor foils, lithium battery current collectors, electrode materials, flexible circuits, solar reflective films, and functional packaging.
A high-efficiency metallization platform for flexible electronics and energy material production.
