Equipment Overview
The ion coating system is a multifunctional vacuum deposition platform designed specifically for universities, laboratories, and research institutes. It is suitable for small-batch, multi-material coating process development and thin-film performance research.
Integrating both magnetron sputtering and cathodic arc deposition technologies, the system can be flexibly configured with various power modes—DC, MF, RF, and HiPIMS (High Power Impulse Magnetron Sputtering)—to meet the diverse requirements of both functional and decorative coatings.
With stable operation and flexible process configuration, the system serves equally well for scientific research, process development, and educational demonstrations.
Structure and Specifications
The system adopts a vertical front-opening design with a compact footprint, making it ideal for installation in laboratories and small-scale production environments.
The vacuum chamber has an internal dimension of Φ400 × 400 mm, suitable for small and medium-sized samples, precision components, and test pieces.
An integrated double-layer cooling jacket ensures temperature uniformity and coating stability throughout the deposition process.
Deposition Methods and Process Configuration
The equipment combines magnetron sputtering and cathodic arc deposition technologies, supporting single-mode or hybrid operation:
Magnetron sputtering: Produces smooth, uniform, and dense coatings—ideal for decorative, functional, and conductive thin films.
Cathodic arc deposition: Generates highly ionized plasma, producing coatings with high adhesion, hardness, and durability—suitable for wear-resistant and corrosion-protective applications.
Multi-target configuration: Supports multiple targets for multilayer, composite, and gradient film structures.
Multi-power compatibility: Compatible with DC, MF, RF, and HiPIMS modes to support various target materials (conductive or non-conductive) and coating properties.
Cathodic Arc System
The system is equipped with three high-performance cathodic arc sources (Φ100 × 40 mm), each independently controlled for fast target exchange and synchronized multi-target deposition.
This design enables the preparation of multilayer or composite coatings within a single process cycle, significantly improving experimental efficiency and coating diversity.
Vacuum and Control System
The system uses a high-efficiency vacuum pumping unit combining mechanical and turbomolecular pumps, enabling rapid evacuation and maintaining a high-vacuum environment.
This minimizes oxidation and contamination, ensuring high coating purity and repeatability.
An automated control system allows precise parameter adjustment and real-time monitoring of arc current, target power, substrate bias, and gas flow.
Process data can be logged and stored for repeatability, parameter optimization, and efficient workflow management.
Operational Features
Vertical door-opening design for easy sample handling and frequent process switching
Multiple target positions for quick material combination and sequential coating
Intuitive automated control interface suitable for teaching and research applications
Depositable Materials and Coating Properties
The system supports a wide range of coating materials, including TiN, CrN, ZrN, TiCN, and TiAlN.
These coatings feature high hardness, excellent adhesion, superior wear resistance, corrosion resistance, and low friction properties, while also maintaining stable decorative colors.
Available Coating Colors
By adjusting target materials, gas ratios, and bias parameters, a wide variety of colors can be achieved—such as gold, silver, gunmetal black, blue, and gradient tones.
The resulting coatings are smooth, glossy, and uniform, making them ideal for both functional studies and teaching demonstrations.
Applications
Thin-film material research and performance testing
Development of new coating processes and surface engineering technologies
University and research institution teaching and demonstration experiments
Surface finishing for small-batch precision parts and functional components
The ion coating system, with its high compatibility, stability, and versatile process design, supports a full range of applications from basic research to small-scale production.
Its hybrid configuration combining magnetron sputtering and cathodic arc technologies enables exploration of various coating structures and properties, making it an ideal platform for research institutions, teaching laboratories, and high-performance thin-film development.
