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Structure and Specifications
The P-3025BY features a vertical chamber design with an internal dimension of Φ300 × 250 mm. It adopts a top-opening structure for convenient operation, making sample placement and retrieval simple and efficient. The compact size of the system makes it particularly suitable for laboratory teaching and entry-level users. Because the internal structure and process flow are clearly visible, instructors can perform live demonstrations of vacuum system operation and thin film deposition processes in the classroom, helping students intuitively understand the fundamental principles of Physical Vapor Deposition (PVD). The sample holder is of a fixed type, ensuring positional stability during deposition and allowing clear observation of the film formation process.
Target and Process Configuration
The system is equipped with one 4-inch planar magnetron target mounted on the top cover, designed for basic magnetron sputtering experiments with common metallic materials. Typical target materials include aluminum (Al), titanium (Ti), copper (Cu), chromium (Cr), and stainless steel (SUS). For introductory oxidation or nitridation experiments, oxygen or nitrogen gases can be introduced to produce functional coatings such as aluminum oxide (Al₂O₃) and titanium nitride (TiN).
The entire system is manually controlled, enabling students to directly adjust process parameters such as gas flow rate, sputtering time, and target power. This hands-on experience allows learners to understand how different parameters influence film thickness, color, and adhesion. The intuitive interaction helps establish a solid foundational understanding of vacuum coating processes.
Vacuum and Control System
The P-3025BY is equipped with an 8 L/s rotary vane vacuum pump, sufficient for conducting sputtering deposition experiments under low-vacuum conditions. The system uses manual valves to control gas flow and pumping rate, offering a simple structure that is easy to operate and maintain. By observing pressure changes, gas flow behavior, and deposition outcomes, students can learn the basic components and working principles of a vacuum system.
The control interface provides fundamental parameter adjustment functions, such as deposition time setting and atmosphere regulation, which can be monitored in real time with pressure gauges and timers.
Application Fields
The P-3025BY is an entry-level PVD experimental system designed specifically for teaching and introductory research, widely used in:
Classroom demonstrations for materials science, physics, and electronic engineering programs.
Basic experiments in vacuum technology and thin film deposition.
Hands-on training courses for developing operational skills.
Introductory coating process experiments such as metallic film deposition (Al, Ti, Cu, SUS, etc.).
Preliminary studies on functional films such as nitrides and oxides (TiN, Al₂O₃, etc.).
Through this system, students can gain a comprehensive understanding of vacuum pumping systems, the principles of magnetron sputtering, and the key steps of thin film deposition. Combining safety, visibility, and interactive teaching features, the P-3025BY is an ideal educational platform for PVD process training in universities, technical institutes, and research laboratories.
