Structure and Specifications
The JSP-1010BY series adopts a vertical front-opening chamber design with an internal dimension of Φ1000 × 1000 mm (H). The spacious chamber accommodates large substrates for batch coating production and advanced process development. The system features a bottom-mounted rotating worktable with both self-rotation and planetary rotation modes, allowing adjustable speed control. This dual-motion design ensures uniform distribution of sputtered particles across the substrate surface, resulting in highly dense films with excellent thickness uniformity, adhesion, and consistent appearance. It provides stable and reliable coating quality for large-size components.
Target and Process Configuration
The system is equipped with four rectangular planar magnetron targets that can be flexibly configured for multi-target co-sputtering or composite film deposition according to specific process requirements.
The standard JSP-1010BY configuration includes two DC magnetron power supplies, one dual-pulse mid-frequency magnetron power supply, and one German HorTeng Truplasma 4010 bias power supply, along with a high-efficiency ion source system. This setup meets a wide range of coating demands—from hard and wear-resistant coatings to decorative and optical films—balancing high productivity with superior performance.
Typical target materials include:
- Metals: titanium (Ti), aluminum (Al), chromium (Cr), zirconium (Zr), stainless steel (SUS), copper (Cu), tungsten (W), molybdenum (Mo).
- Nitrides: titanium nitride (TiN), chromium nitride (CrN), titanium aluminum nitride (TiAlN), zirconium nitride (ZrN), aluminum titanium nitride (AlTiN).
- Oxides: indium tin oxide (ITO), aluminum oxide (Al₂O₃), silicon dioxide (SiO₂), zinc oxide (ZnO).
- Carbon-based materials: graphite (C), tungsten carbide/carbon (WC/C) for low-friction and wear-resistant coatings.
- Users can also select various target combinations to achieve multilayer, composite, or gradient film structures.
Vacuum and Control System
The system employs a combination of a high-performance turbomolecular pump and a mechanical forepump, enabling rapid attainment of high-vacuum conditions. This setup minimizes impurity levels and oxidation risk, ensuring film purity and process stability.
The fully automated industrial-grade control platform offers multi-channel precision control, allowing independent setting and real-time monitoring of target power, gas ratio, vacuum level, deposition time, and substrate rotation speed. All process data are automatically recorded, supporting curve tracking, historical comparison, and convenient process optimization and batch management.
Application Fields
The JSP-1010BY is designed for high-performance thin film deposition on medium to large components, widely applicable across both industrial and research fields:
- Hard coatings: Applied to tools, molds, and cutting edges to improve hardness and wear resistance, such as TiAlN, CrN, TiN, and AlTiN.
- Anti-friction coatings: Used on bearings, pistons, and sliding mechanical parts to reduce friction and extend service life, including WC/C, DLC, and MoS₂ coatings.
- Functional coatings: For electronic and precision components requiring conductivity, corrosion resistance, electromagnetic shielding, or infrared reflection.
- Decorative coatings: Used for high-end decorative parts, hardware accessories, watches, and automotive components, providing metallic luster, colorful finishes, and durable surfaces.
With its large chamber design, flexible power configuration, and high-precision automated control, the JSP-1010BY series serves as an ideal platform for high-end magnetron sputtering applications—supporting research development, pilot production, and full-scale industrial manufacturing.
