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Structure and Specifications
The JSP-1312BY series features a vertical front-opening chamber design with an internal dimension of Φ1300 × 1200 mm (H). The spacious chamber can accommodate extra-large workpieces, making it a versatile vacuum coating platform developed for high-performance, large-scale coating production. The system is equipped with a bottom-mounted rotary table that supports both self-rotation and planetary rotation modes with adjustable speeds. Multi-axis rotation enables highly uniform deposition, resulting in consistent film thickness, dense structure, and smooth surfaces—ideal for applications requiring exceptional coating uniformity.
Target and Process Configuration
The system integrates four cylindrical magnetron targets and eight arc sources (arranged symmetrically with four on the upper and four on the lower side). These can be flexibly combined according to process requirements to achieve hybrid deposition using both magnetron sputtering and cathodic arc technologies.
Standard configuration includes:
Four DC magnetron power supplies
One bias power supply
One high-efficiency ion source
One high-performance turbomolecular pumping system
The system supports multiple deposition processes within a single chamber, such as:
Magnetron sputtering for uniform metal or oxide thin films.
Arc evaporation for dense, high-adhesion hard coatings.
Ion-source-assisted deposition to further improve film adhesion and surface smoothness.
Typical target materials include titanium (Ti), aluminum (Al), chromium (Cr), zirconium (Zr), tungsten (W), molybdenum (Mo), and stainless steel (SUS), as well as composite targets such as TiAl, CrAl, and TiSi. The system can produce various functional films, including nitrides (TiN, CrN, TiAlN), carbon-based coatings (DLC, WC/C), and oxides (Al₂O₃, TiO₂, ZnO).
Vacuum and Control System
The vacuum system combines a high-performance turbomolecular pump with a mechanical backing pump, enabling rapid achievement of high vacuum levels. This effectively suppresses oxidation and contamination, ensuring high coating purity. The fully automated control platform provides precise multi-channel control of target power, arc power, gas ratios, bias voltage, and rotation speed. All process parameters are continuously monitored and recorded. The system also includes data traceability functions and can generate process reports, ensuring coating uniformity and repeatability across different production batches.
Application Fields
The JSP-1312BY series is designed for large-scale, high-demand coating production and is widely used in the following fields:
Hard coatings: Applied to cutting tools, molds, and stamping parts to improve surface hardness and wear resistance, such as TiN, TiAlN, CrN, and AlTiN.
Anti-friction coatings: Used on mechanical bearings, piston rings, and pump or valve components to reduce friction and extend service life, such as WC/C, DLC, and MoS₂.
Functional coatings: Used for electronic devices, precision components, and industrial protection parts, providing properties such as conductivity, corrosion resistance, and electromagnetic shielding.
Decorative coatings: Applied to premium hardware, watch cases, bathroom fixtures, and automotive parts, delivering metallic gloss, mirror finishes, and colorful decorative appearances.
With its large-chamber design, dual-process hybrid system, and intelligent automation platform, the JSP-1312BY achieves high-quality, high-adhesion film deposition under high-throughput conditions, making it one of the core systems in advanced PVD/CVD production lines.
